Author:
Li-Jun SHEN,Yong-Jian WAN,Kai MENG,Chuan-Ke HUANG
Publisher
Springer Science and Business Media LLC
Subject
Atomic and Molecular Physics, and Optics
Reference14 articles.
1. Shengyi, L.: New technology for manufacturing and measurement of large and middle-scale aspheric surfaces, pp 12–20. National Defense Industry Press (2011)
2. Lee, M.: COOK, Chemical processes in glass polishing. J. Non-Cryst. Solids 120, 152 (1990)
3. Cumbo, M.J., Fairhurst, D., Jacobs, S.D., Puchebner, B.E.: Slurry particle size evolution during the polishing of optical glass. Appl. Opt. 34, 3743 (1995)
4. Shi, F.G., Zhao, B.: Modeling of chemical-mechanical polishing with soft pads. Appl. Phys. A (Mater. Sci. Proc.) 67(2), 249–252 (1998)
5. Shi, F.G., Zhao, B., Wang, S.-Q.: A new theory for CMP with soft pads. IITC 7, 73–75 (1998)
Cited by
4 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献