Deposition of silicon oxynitride films by ion beam sputtering at room temperature
Author:
Publisher
Springer Science and Business Media LLC
Subject
Atomic and Molecular Physics, and Optics
Link
http://link.springer.com/content/pdf/10.1007/s10043-009-0042-3.pdf
Reference10 articles.
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5. B. G. Bovard, J. Ranm, R. Hora, and F. Hanselmann: Appl. Opt. 28 (1989) 4436.
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