Impact of Post-Deposition Annealing on Electrical Properties of RF-Sputtered Cu2O/4H-SiC and NiO/4H-SiC PiN Diodes
Author:
Funder
Korea Institute for Advancement of Technology
Korea Evaluation Institute of Industrial Technology
Publisher
Springer Science and Business Media LLC
Link
https://link.springer.com/content/pdf/10.1007/s13391-024-00484-1.pdf
Reference60 articles.
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