Beam Processing Techniques Applied to Crystal Silicon Substrates-Reference-Cited by-同舟云学术

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Beam Processing Techniques Applied to Crystal Silicon Substrates

Published:1982 Issue: Volume: Page:254-280
ISSN:
Container-title:Large Scale Integrated Circuits Technology: State of the Art and Prospects
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Author:

Soncini Giovanni

Publisher

Springer Netherlands

Link

http://link.springer.com/content/pdf/10.1007/978-94-009-7645-0_10.pdf

Reference46 articles.

1. S. D. Ferris, H. J. Leamy and J. M. Poate, ‘Laser-Solid Interactions and Laser Processing,’ Academic Press (1979).

2. C. W. White and P. S. Peercy, ‘Laser and Electron Beam Processing of Materials,’ Academic Press (1980).

3. C. L. Anderson, G. K. Celler and G. A. Rozgonyi, ‘Laser and Electron Beam Processing of Electronics Materials,’ Electrochemical Society (1980).

4. J. F. Gibbons, L. C. Hess and T. W. Sigmon, ‘Laser and Electron Beam Solid Interactions and Materials Processing,’ North-Holland (1981).

5. C. Hill, Ref. 4, p. 361.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Temperature evolution during scanning electron beam processing of silicon;Applied Physics A Materials Science and Processing;1996-05

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