1. H. C. Gatos and M. C. Lavine, “Chemical Behavior of Semiconductors: Etching Characteristics.” In Progress in Semiconductors, Vol. 9, ed. A. F. Gibson and R. E. Burgess, pp. 1–46. London: Temple, 1965
2. D. J. Elliott, Integrated Circuit Fabrication Technology. New York: McGraw-Hill, 1982. Table 11–3, pp. 260–263
3. W. Kern and C. A. Dickert, “Chemical Etching.” In Thin Film Processes, ed. J. L. Vossen and W. Kern. New York: Academic Press, 1967. Chapter V - 1
4. S. K. Ghandhi, The Theory and Practice of Microelectronics. New York: Wiley, 1968
5. A. Beiser and K. B. Krauskopf, Introduction to Physics and Chemistry. New York: McGraw-Hill, 1964