Structural, Optical and Electrical Properties of ZnO Thin Films Doped with Al, V and Nb, Deposited by r.f. Magnetron Sputtering-Reference-Cited by-同舟云学术

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Structural, Optical and Electrical Properties of ZnO Thin Films Doped with Al, V and Nb, Deposited by r.f. Magnetron Sputtering

Published:2014-12-18 Issue: Volume: Page:289-301
ISSN:1874-6489
Container-title:Nanoscience Advances in CBRN Agents Detection, Information and Energy Security
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Author:

Lovchinov K.,Petrov M.,Angelov O.,Nichev H.,Mikli V.,Dimova-Malinovska D.

Publisher

Springer Netherlands

Link

http://link.springer.com/content/pdf/10.1007/978-94-017-9697-2_29

Reference26 articles.

1. Li Y, Gong J, McCune M, He G, Deng Y (2010) Synth Met 160:499

2. Seshadri R (2005) Curr Opinion Solid State Mater Sci 9:1

3. Minami T (2005) Semicond Sci Technol 20:S35

4. Koshizaki N, Oyama T (2000) Sensors Actuators B 66:119

5. Saeki H, Tabata H, Kawai T (2001) Solid State Commun 120:439

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Aluminum-doped zinc oxide thin films deposited by electrospray method;Optical Materials;2019-03

2. The modification of the characteristics of nanocrystalline ZnO thin films by variation of Ta doping content;Philosophical Magazine;2016-06-16

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