Author:
Shorubalko Ivan,Pillatsch Lex,Utke Ivo
Publisher
Springer International Publishing
Reference104 articles.
1. B.W. Ward, J.A. Notte, N.P. Economou, Helium ion microscope: a new tool for nanoscale microscopy and metrology. J. Vacuum Sci. Technol. B: Microelectr. Nanometer Struct. 24(6), 2871–2874 (2006)
2. T. Hrncir et al., Novel plasma FIB/SEM for high speed failure analysis and real time imaging of large volume removal, in Conference Proceedings of the 38th International Symposium for Testing and Failure Analysis, 2012, pp. 26–29
3. J. Gierak, Focused ion beam technology and ultimate applications. Semicond. Sci. Technol. 24(4), 043001 (2009)
4. J. Melngailis, Focused ion-beam technology and applications. J. Vac. Sci. Technol. B 5(2), 469–495 (1987)
5. P.F.A. Alkemade, H. Miro, Focused helium-ion-beam-induced deposition. Appl. Phys. A-Mater. Sci. Process. 117(4), 1727–1747 (2014)
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