Template Optimization of Block Copolymer Thin Films by Self-Assembly Process
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Publisher
Springer International Publishing
Link
http://link.springer.com/content/pdf/10.1007/978-3-319-89707-3_19
Reference18 articles.
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2. Jeong, J.W., Park, W.I., Kim, M., Ross, C.A., Jung, Y.S.: Highly tunable self-assembled nanostructures from a poly (2-vinylpyridine-b-dimethylsiloxane) block copolymer. J. Nano Lett. 11, 4095–4101 (2011)
3. Segalman, R.A.: Patterning with block copolymer thin films. Mater. Sci. Eng. R 48, 191–226 (2005)
4. Li, M., Coenjarts, C.A., Ober, C.K.: Patternable block copolymers. Adv. Polym. Sci. 190, 183–226 (2005)
5. Bates, F.S., Fredrickson, G.H.: Block copolymer thermodynamics: theory and experiment. Ann. Rev. Phys. Chem 41, 525–57 (1990)
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