Layout Decomposition for Triple Patterning
Author:
Publisher
Springer International Publishing
Link
http://link.springer.com/content/pdf/10.1007/978-3-319-20385-0_2
Reference37 articles.
1. Kahng, A.B., Park, C.-H., Xu, X., Yao, H.: Layout decomposition approaches for double patterning lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 29, 939–952 (2010)
2. Yuan, K., Yang, J.-S., Pan, D.Z.: Double patterning layout decomposition for simultaneous conflict and stitch minimization. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 29(2), 185–196 (2010)
3. Xu, Y., Chu, C.: GREMA: graph reduction based efficient mask assignment for double patterning technology. In: IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 601–606 (2009)
4. Yang, J.-S., Lu, K., Cho, M., Yuan, K., Pan, D.Z.: A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography. In: IEEE/ACM Asia and South Pacific Design Automation Conference (ASPDAC), pp. 637–644 (2010)
5. Xu, Y., Chu, C.: A matching based decomposer for double patterning lithography. In: ACM International Symposium on Physical Design (ISPD), pp. 121–126 (2010)
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