Effects of the reaction parameters on the deposition characteristics in ZrO2 CVD-Reference-Cited by-同舟云学术

Effects of the reaction parameters on the deposition characteristics in ZrO2 CVD

Published:1992-06 Issue:2 Volume:3 Page:87-92
ISSN:0957-4522
Container-title:Journal of Materials Science: Materials in Electronics
language:en
Short-container-title:J Mater Sci: Mater Electron

Author:

Choi Joon-Hoo,Kim Ho-Gi,Yoon Soon-Gil

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF00695722.pdf

Reference15 articles.

1. E. S. SCHLEGEL,IEEE Trans. Elec. Devices ED-14 (1957) 728;ED-15 (1958) 951.

2. D. R. HARBISON and H. L. TAYLOR, in ?Thin film dielectrics? edited by F. Vratny (Electrochemical Society, New York, 1959) pp. 254?271.

3. M. T. DUTTY, C. C. WANG, A. WAXMAN and K. H. ZAININGER,J. Electrochem. Soc. 116 (1969) 234.

4. G. WAHL, S. SCHLOSSER, F. SCHMADERER, in Proceedings, 7th International CVD Conference, Los Angeles, 1979, edited by T. O. Sedgewick and H. Lydtin (ECS Prineton, 1979) pp. 536?543.

5. K. S. MASDIYASNI and C. T. LYNCH, USAF Rep. ASD-TDR-63-322, May (1963).

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