1. T. M. Serebryakova, V. A. Neronov, and P. D. Peshev,High-Temperature Borides [in Russian], Metallurgia, Moscow (1991).
2. A. S. Dranenko and L. A. Dvorina, “Borides of transient metals as candidates for microelectronics,” in:High-Melting Compounds in Microelectronics [in Russian], Kiev (1996), pp. 10–14.
3. G. Sade and J. Pelleg, “Sputter deposition and characterization of TiB2/TiSi2 bilayer contact structure,”Microelectron Eng.,38, 535–541 (1997).
4. C. L. Chopra,Electric Phenomena in Thin Films [Russian translation], Mir, Moscow (1972).
5. Yu. F. Komnik,Physics of Metallic Films [in Russian], Atomizdat, Moscow (1979).