Removal of Carbon Contamination on Si Wafers with an Excimer Lamp-Reference-Cited by-同舟云学术

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Removal of Carbon Contamination on Si Wafers with an Excimer Lamp

Published:2007-04-05 Issue:3 Volume:38 Page:596-598
ISSN:1073-5623
Container-title:Metallurgical and Materials Transactions A
language:en
Short-container-title:Metall and Mat Trans A

Author:

TODE MAYUMI,TAKIGAWA YASUO,IGUCHI TAIZO,MATSUURA HIDEHARU,OHMUKAI MASATO,SASAKI WATARU

Publisher

Springer Science and Business Media LLC

Subject

Metals and Alloys,Mechanics of Materials,Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1007/s11661-007-9104-y.pdf

Reference8 articles.

1. B. Eliasson, U. Kogelschatz: Appl. Phys., 1988, vol. B46, pp. 299–303

2. B. Gellert, U. Kogelschatz: Appl. Phys., 1991, vol. B52, pp. 14–21

3. K. Toshikawa, A. Yokotani, K Kurosawa: Jpn. J. Appl. Phys., 2005, vol. 44, pp. 7785–88

4. Y. Takigawa, K. Kurosawa, W. Sasaki, M. Okuda, K. Yoshida, E. Fujiwara, Y. Kato, Y. Inoue: J. Non-Cryst. Solids, 1990, vol. 125, pp. 107–16

5. K. Kurosawa, Y. Takigawa, W. Sasaki, M. Katto, Y. Inoue: Jpn. J. Appl. Phys., 1991, vol. 30, pp. 3219–3322

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