Mechanisms of Hf dopant incorporation during the early stage of chemical vapor deposition aluminide coating growth under continuous doping conditions-Reference-Cited by-同舟云学术

Mechanisms of Hf dopant incorporation during the early stage of chemical vapor deposition aluminide coating growth under continuous doping conditions

Published:2004-11 Issue:11 Volume:35 Page:3581-3593
ISSN:1073-5623
Container-title:Metallurgical and Materials Transactions A
language:en
Short-container-title:Metall and Mat Trans A

Author:

Kim G. Y.,He L. M.,Meyer J. D.,Lee W. Y.,Quintero A.,Haynes J. A.

Publisher

Springer Science and Business Media LLC

Subject

Metals and Alloys,Mechanics of Materials,Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1007/s11661-004-0194-5.pdf

Reference45 articles.

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4. S.M. Meier, D.K. Gupta, and K.D. Sheffler: J. Met., 1991, Mar., pp. 50–53.

5. A. Maricocchi, A. Bartz, and D.J. Wortman: Proc. 1995 Thermal Barrier Coating Workshop, W.J. Brindley, ed., NASA Conference Publication No. 3312, Washington, DC, 1995, p. 79.

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