Author:
Delaye V.,Andrieu F.,Aussenac F.,Carabasse C.
Publisher
Springer Berlin Heidelberg
Reference4 articles.
1. T. Tessner, European Semiconductors, 26(9), September 2004
2. N. Bicaïs-Lépiney et al., Proceedings of SPIE vol. 6152, Metrology, inspection, and process control for microlithography XX (2006)
3. D. Mello et al., Nuclear Instruments and Methods in Physics Researsh B 257 (2007) 805–809
4. V. Delaye et al., Microelectron. Eng. (2008), article in press: doi:10.1016/j.mee.2008.01.092