Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-CI-H-Reference-Cited by-同舟云学术

Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-CI-H

Published:1989-01 Issue:1 Volume:8 Page:98-101
ISSN:0261-8028
Container-title:Journal of Materials Science Letters
language:en
Short-container-title:J Mater Sci Lett

Author:

Touanen M.,Teyssandier F.,Ducarroir M.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00720264.pdf

Reference26 articles.

1. F. TEYSSANDIER, C. BERNARD and M. DUCARROIR,J. Mater. Sci. 23 (1988) 135.

2. Idem, J. Electrochem. Soc. 135 (1988) 225.

3. T. HIRAI and T. GOTO,J. Mater. Sci. 16 (1981) 17.

4. Idem, Proceedings of the 10th International Conference on CVD, 18?23 October 1987, Honolulu, edited by G. W. Cullen (Electrochemical Society) p. 1074.

5. J. F. LARTIGUE, M. DUCARROIR and B. ARMAS, Proceedings of the 9th International Conference on CVD, 7?8 May 1984, Cincinnati, Ohio, USA, edited by D. Robinson, (Electrochemical Society) p. 561.

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