Impact of Annealing Temperature on Spin Coated V2O5 Thin Films as Interfacial Layer in Cu/V2O5/n-Si Structured Schottky Barrier Diodes-Reference-Cited by-同舟云学术

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Impact of Annealing Temperature on Spin Coated V2O5 Thin Films as Interfacial Layer in Cu/V2O5/n-Si Structured Schottky Barrier Diodes

Published:2019-03-08 Issue:5 Volume:29 Page:1533-1547
ISSN:1574-1443
Container-title:Journal of Inorganic and Organometallic Polymers and Materials
language:en
Short-container-title:J Inorg Organomet Polym

Author:

Balasubramani V.,Chandrasekaran J.,Marnadu R.,Vivek P.,Maruthamuthu S.,Rajesh S.

Funder

DST, Government of India, for the major research project

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Polymers and Plastics

Link

http://link.springer.com/content/pdf/10.1007/s10904-019-01117-z.pdf

Reference66 articles.

1. N.S. Kumar, M.S. Raman, J. Chandrasekaran, R. Priya, M. Chavali, R. Suresh, Mater. Sci. Semicond. Process. 41, 497 (2016)

2. S. Mahato, D. Biswas, L.G. Gerling, C. Voz, J. Puigdollers, AIP Adv. 7, 085313 (2017)

3. Z. Liu, S.P. Lau, F. Yan, Chem. Soc. Rev. 44, 5638 (2015)

4. P.D. Raj, S. Gupta, M. Sridharan, Ceram. Int. 43, 9401 (2017)

5. S. Beke, Thin Solid Films 519, 1761 (2011)

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