Cyclophosphazene-containing Polymers as Imprint Lithography Resists-Reference-Cited by-同舟云学术

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Cyclophosphazene-containing Polymers as Imprint Lithography Resists

Published:2007-03-03 Issue:2 Volume:17 Page:377-385
ISSN:1574-1443
Container-title:Journal of Inorganic and Organometallic Polymers and Materials
language:en
Short-container-title:J Inorg Organomet Polym

Author:

Hagberg Erik C.,Hart Mark W.,Cong Lianhui,Allen Christopher W.,Carter Kenneth R.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Polymers and Plastics

Link

http://link.springer.com/content/pdf/10.1007/s10904-007-9130-7.pdf

Reference27 articles.

1. H. Ito, in Microlithography – Molecular Imprinting (ACS Symposium Series 172, Washington, DC, 2005) pp. 37–245

2. E. Reichmanis, L. F. Thompson, Chem. Rev., 89, 1273 (1989)

3. B. D. Gates, Q. B. Xu, M. Stewart, D. Ryan, C. G. Willson, G. M. Whitesides, Chem. Rev. 105, 1171 (2005)

4. G. M. McClelland, M. W. Hart, C. T. Rettner, M. E. Best, K. R. Carter, B. D. Terris, Appl. Phys. Lett. 81, 1483 (2002)

5. G. M. McClelland, C. T. Rettner, M. W. Hart, K. R. Carter, M. I. Sanchez, M. E. Best, B. D. Terris, Tribol. Lett., 19, 59 (2005)

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1. Cyclotriphosphazene based materials: Structure, functionalization and applications;Progress in Materials Science;2024-04

2. Novel one-component molecular glass photoresist based on cyclotriphosphazene containing t-butyloxy carbonyl group for i-line lithography;Journal of Polymer Research;2017-03-29

3. The mechanism of a phosphazene–phosphazane rearrangement;Dalton Transactions;2016

4. Nanoimprint Lithography of Polymers;Polymer Science: A Comprehensive Reference;2012

5. Electronic structure and reaction mechanism as guides to the design of hybrid inorganic–organic polymers;Inorganica Chimica Acta;2011-06

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