The influence of surface kinetics in modelling chemical vapour deposition processes in porous preforms-Reference-Cited by-同舟云学术

The influence of surface kinetics in modelling chemical vapour deposition processes in porous preforms

Published:1996-06 Issue:11 Volume:31 Page:3021-3033
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:JOURNAL OF MATERIALS SCIENCE

Author:

Dekker J. P.,Moene R.,Schoonman J.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00356018.pdf

Reference65 articles.

1. H. O. Pierson, Handbook of Chemical Vapour Deposition (CVD), (Noyes Publications, 1992) 225.

2. F. Christin, R. Naslain and C. Bernard, in Proceedings of the 7th International Conference on Chemical Vapour Deposition, 1979, edited by T. O. Sedgwick and H. Lydtin (The Electrochemical Society, Princeton, 1979) 79-3 499.

3. R. Colmet, I. Lhermitte-Sebire and R. Naslain, Adv. Ceram. Mater., 1 (1986) 185.

4. S. Marinković and S. Dimitrijević, J. Chimie Physique 84 (1987) 1421.

5. D. P. Stinton, T. M. Besmann and R. A. Lowden, Ceram. Bull. 67 (1988) 350.

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