Template approaches to growth of oriented oxide heterostructures on SiO2/Si

Author:

Ramesh R.,Sands T.,Keramidas V. G.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. See for example, Proc. of Materials Research Society Fall Meeting Symp. onFerroelectric Thin Films II, eds. A. Kingon, E.R. Myers and B. Tuttle, (Pittsburgh, PA: Materials Research Society, 1991);Proc. of MRS Spring 1993 Meeting, San Francisco, CA, April 1993;Proc. of Third Intl. Symp. on Integrated Ferroelectrics, ed. C.A. Paz de Araujo, University of Colorado, Colorado Springs, CO, April 1991;Proc. of Fourth Intl. Symp. on Integrated Ferroelectrics, Monterey, CA, March 1992;Proc. of Fifth Intl. Symp. on Integrated Ferroelectrics, Colorado Springs, CO, April 1993.

2. J.F. Scott and C.A. Paz de Araujo,Science 246, 1400 (1989); M. Sayer and K. Sreenivas,Science 247, 1056 (1990); G.H. Haertling,J. of Vac. Sci. and Techn. 9, 414 (dy1991).

3. S. Sinharoy, H. Buhay, D.R. Lampe and M.H. Francombe,J. of Vac. Sci. and Techn. A10, 1554 (1992).

4. J.T. Evans and R.D. Womack,IEEE J. of Solid State Circuits 23, 1171 (1988).

5. S.K. Dey and R. Zuleeg,Ferroelectrics 108, 37 (1990).

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