Methods of production, structure, and properties of film materials based on the carbon—nitrogen system (survey)
Author:
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Metals and Alloys,Mechanics of Materials,Condensed Matter Physics,Ceramics and Composites
Link
http://link.springer.com/content/pdf/10.1007/BF02680122.pdf
Reference56 articles.
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2. A. Y. Liu and M. L. Cohen, “Structure, properties, and electronic structure of low-compressibility materials: β-Si3N4 and hypothetical β-C3N4,”Phys. Rev. B,41, No. 15, 10727–10734 (1990-II).
3. J. J. Cuomo, P. A. Leary, D. Yu, et al., “Reactive sputtering of carbon and carbon targets in nitrogen,”J. Vac. Sci. Technol.,16, No. 2, 299–302 (1979).
4. C. J. Torng, M. M. Siversten, J. H. Judy, and C. Chang, “Structure and bonding studies of CN films produced by rf sputtering method,”J. Mater. Res.,5, No. 11, 2490–2496 (1990).
5. S. Kumar and T. L. Tansley, “Elemental composition and microstructure of reactively sputtered CN films,”J. Appl. Phys.,76, No. 7, 4390–4392 (1994).
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