Synchrotron radiation analysis of microstructures-Reference-Cited by-同舟云学术

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Synchrotron radiation analysis of microstructures

Published:1996-05 Issue:2 Volume:2 Page:56-62
ISSN:0946-7076
Container-title:Microsystem Technologies
language:en
Short-container-title:Microsystem Technologies

Author:

Mölders N.,Moser H. O.,Menz W.,Schilling P. J.,Saile V.

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF02447751.pdf

Reference9 articles.

1. Galhotra V; He J-H; Natarajan A; McCarley RL; Ma E (1995) Electrodeposited nickel and nickel alloys for applications in LIGA microsystems. In: Science and Technology at CAMD, pp. 201–204. Proc. of the 1995 Workshop, Louisiana State University, Baton Rouge

2. Gobet J;Cardot F;Bergqist J;Rudolf F (1993) Electrodeposition of 3D microstructures on silicon. J. Micromech. Microeng. 3: 123–130

3. Golovchenko JA;Levesque RA;Cowan PL (1981) Rev. Sci. Instrum. 52: 51

4. Gurman SJ (1990) EXAFS and structural studies of glasses In: Applications of Synchrotron Radiation, Catlow, CRA; Greaves GN (eds) pp. 140–170, Glasgow and London: Blackie

5. Lengeler B (1987), Applications of synchrotron radiation in materials analysis. Mikrochim. Acta (Wien) I, pp. 455–475

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