Author:
Tezuka Meguru,Yajima Tatsuhiko
Publisher
Springer Science and Business Media LLC
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry
Reference15 articles.
1. H. Suhr,Plasma Chem. Plasma Process. 3, 1 (1983).
2. J. G. Huntington and L. L. Miller,J. Am. Chem. Soc. 98, 8101 (1976); M. Tezuka and L. L. Miller, ibid., 99, 5832 (1977).
3. L. L. Miller and A. B. Szabo,J. Org. Chem. 44, 1670 (1979); Y. H. So and L. L. Miller,J. Am. Chem. Soc. 102, 7119 (1980) ; ibid.,103, 4209 (1981).
4. M. Tezuka, T. Yajima, and A. Tsuchiya, Cheer. Lett.1982, 1437.
5. M. Teztika, T. Yajima. and A. Tsuchiya,Advances in Low-Temperature Plasma Chemistry, Technology, Applications, Vol. 1, H. V. Boenig, ed., Technomic Publishing Co. (1984), pp. 365.
Cited by
22 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献