Applications of ICP-MS in semiconductor industry
Author:
Publisher
Springer Science and Business Media LLC
Subject
Biochemistry
Link
http://link.springer.com/content/pdf/10.1007/s002160051355.pdf
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The Impact of Surface Voltage on Photoluminescence Response for the Detection of Copper and Iron Contamination in Silicon;physica status solidi (a);2021-10-31
2. Study on the Formation Process of Oxide Ion and the Influence of Carbon Matrix in Inductively Coupled Plasma Mass Spectrometry Using 18O-Labeled Arsenous Acid;Bulletin of the Chemical Society of Japan;2021-05-15
3. Imaging of Metal Ions and Nanoparticles on Structured Silicon Surface Using Laser Ablation-Inductively Coupled Plasma-Mass Spectrometer for Contamination Control in Semiconductor Manufacturing Process;IEEE Transactions on Semiconductor Manufacturing;2021-05
4. Study on carbon-induced signal enhancement in inductively coupled plasma mass spectrometry: an approach from the spatial distribution of analyte signal intensities;Journal of Analytical Atomic Spectrometry;2019
5. Inductively coupled plasma mass spectrometry and standard dilution analysis applied to concentrated acids;Talanta;2016-12
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