1. Donnelly, V.M., Plasma Diagnosis Relevant to Damage, in Tutorial, International Symp. Plasma Process Induced Damage (P2ID). 2000.
2. Malyshev, M.V., V.M. Donnelly, and J.I. Colonell, Plasma diagnosis and charging damage. in International Symp. Plasma Process Induced Damage (P2ID). 1999. p. 149.
3. Malyshev, M.V. and V.M. Donnelly, Trace rare gases optical emission spectroscopy: A non-intrusive method for measuring electron temperatures in low-pressure, low-temperature plasmas. Phys. Rev. E, 1999. 60: p. 6016.
4. Malyshev, M.V. and V.M. Donnelly, Determination of Electron Temperature in Plasmas by Multiple Rare Gas optical Emission and Implications for Advanced Actinometry. J. Vac. Sci. Technol. A, 1997. 15: p. 550.
5. Ma, S., Characterization of plasma processing induced charging damage to MOS devices, Ph.D thesis, Department of Material Science and Engineering, Stanford University, 1996.