Step and Flash Imprint Lithography-Reference-Cited by-同舟云学术

Step and Flash Imprint Lithography

Published:2003 Issue: Volume: Page:117-137
ISSN:1571-5744
Container-title:Alternative Lithography
language:
Short-container-title:

Author:

Bailey T. C.,Colburn M.,Choi B. J.,Grot A.,Ekerdt J. G.,Sreenivasan S. V.,Willson C. G.

Publisher

Springer US

Link

http://link.springer.com/content/pdf/10.1007/978-1-4419-9204-8_7

Reference34 articles.

1. S.I.A., International Technology Roadmap for Semiconductors,. 2001: available at http://www.public.itrs.net/Files/2001ITRS/Home.html .

2. Chou, S.Y., P.R. Krauss, and P.J. Renstrom, Nanoimprint lithography. J. Vac. Sci. Tech. B, 1996. 14(6): p. 4129.

3. Colburn, M., et al., Step and Flash Imprint Lithography: A new approach to high resolution patterning. Proc. SPIE: Emerging Lithographic Technologies III, 1999. 3676(1): p. 379.

4. Haisma, J., et al., Mold-assisted nanolithography: A process for reliable pattern replication. J. Vac. Sci. Tech. B, 1996. 14(6): p. 4124.

5. Xia, Y. and G.M. Whitesides, Soft Lithography. Angew. Chem. Int. Ed. Engl., 1998. 37: p. 550.

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fast Graph Transformation based Direct Solver Algorithm for Regular Three Dimensional Grids;Procedia Computer Science;2014

2. Direct Nanoimprinting for Micro- and Nanosystems;Bio and Nano Packaging Techniques for Electron Devices;2012

3. Application of Hierarchical Chromosome Based Genetic Algorithm to the problem of finding optimal initial three dimensional meshes for the self adaptive hp-Finite Element Method;Procedia Computer Science;2011

4. Non-Optical Lithography;Nanotechnology;2010-03-15

5. Mass production of bio-inspired structured surfaces;Proceedings of the Institution of Mechanical Engineers, Part C: Journal of Mechanical Engineering Science;2007-09-30