Change in Microstructure and Magnetic Properties of Transition Metal Nitride Thin Films by Substrate Temperature
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Publisher
Springer International Publishing
Link
http://link.springer.com/content/pdf/10.1007/978-3-030-31866-6_8
Reference14 articles.
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3. Lingwal, V., Panwar, N.S.: Scanning magnetron-sputtered TiN coating as diffusion barrier for silicon devices. J. Appl. Phys. 97, 104902 (2005)
4. Mosca, D.H., Dionisio, P.H., Schreiner, W.H., et al.: Compositional and magnetic properties of iron nitride thin films. J. Appl. Phys. 67, 7514–7519 (1990)
5. Bartłomiej, W., Arabczyk, W.: Investigation of nitriding and reduction processes in a nanocrystalline iron–ammonia–hydrogen system at 350 C. Phys. Chem. Chem. Phys. 17, 20185–20193 (2015)
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