Generation and Annealing of Crystalline Disorder in Laser Processing of Silicon
Author:
Publisher
Springer International Publishing
Link
https://link.springer.com/content/pdf/10.1007/978-3-030-63647-0_15
Reference76 articles.
1. Amer MS, El-Ashry MA, Dosser LR, Hix KE, Maguire JF, Irwin B (2005) Femtosecond versus nanosecond laser machining: comparison of induced stresses and structural changes in silicon wafers. Appl Surf Sci 242:162
2. Ametowobla M, Bilger G, Kohler JR, Werner JH (2012) Laser induced lifetime degradation in p-type crystalline silicon. J Appl Phys 111:114515
3. Arora VK, Dawar AL (1996) Laser-induced damage studies in silicon and silicon-based photodetectors. Appl Opt 35:7061
4. Bergmann S, Albe K, Flegel E, Barragan-Yani DA, Wagner B (2017) Anisotropic solid-liquid interface kinetics in silicon: an atomistically informed phase-field model. Model Simul Mater Sci Eng 25:065015
5. Bernstein N, Aziz MJ, Kaxiras E (2000) Atomistic simulations of solid-phase epitaxial growth in silicon. Phys Rev B 61:6696
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