Development of PECVD SiN Thin Films for Integrated Photonic Applications on 300 mm Wafers
Author:
Publisher
Springer Nature Switzerland
Link
https://link.springer.com/content/pdf/10.1007/978-3-031-63378-2_83
Reference11 articles.
1. Xiang, C., Jin, W., Bowers, J.E.: Silicon nitride passive and active photonic integrated circuits: trends and prospects. Photon. Res. 10(6), A82 (2022)
2. Ji, X., et al.: Ultra-low-loss silicon nitride photonics based on deposited films compatible with foundries. Laser Photonics Rev. 17(3), 2200544 (2023)
3. Novak, A.V., Novak, V.R., Dedkova, A.A., Gusev, E.E.: Dependence of mechanical stresses in silicon nitride films on the mode of plasma-enhanced chemical vapor deposition. Semiconductors 52(15), 1953 (2018)
4. Ay, F., Aydinli, A.: Comparative investigation of hydrogen bonding in silicon based PECVD grown dielectrics for optical waveguides. Opt. Mater. 26(1), 33 (2004)
5. Mao, S.C., et al.: Low propagation loss SiN optical waveguide prepared by optimal low-hydrogen module. Opt. Express 16(25), 20809 (2008)
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