Simulation of the Influence of High-Voltage Pulsed Potential Supplied During the Deposition on the Structure and Properties of the Vacuum-Arc Nitride Coatings-Reference-Cited by-同舟云学术

Simulation of the Influence of High-Voltage Pulsed Potential Supplied During the Deposition on the Structure and Properties of the Vacuum-Arc Nitride Coatings

Published:2019-06-07 Issue: Volume: Page:447-455
ISSN:2195-4356
Container-title:Lecture Notes in Mechanical Engineering
language:
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Author:

Pinchuk Nataliya^ORCID,Sobol Oleg^ORCID

Publisher

Springer International Publishing

Link

http://link.springer.com/content/pdf/10.1007/978-3-030-22365-6_45

Reference20 articles.

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2. Bradley, R.M., Harper, J.M.E., Smith, D.A.: Theory of thin-film orientation by ion bombardment during deposition. J. Appl. Phys. 60, 4160 (1986)

3. Heinrich, S., Schirmer, S., Hirsch, D., Gerlach, J.W., Manova, D., Assmann, W., Mändl, S.: Comparison of ZrN and TiN formed by plasma based ion implantation & deposition. Surf. Coat. Technol. 202(11), 2310–2313 (2008)

4. Sobol’, O.V.: The influence of nonstoichiometry on elastic characteristics of metastable β-WC1-x phase in ion plasma condensates. Tech. Phys. Lett. 42(9), 909–911 (2016)

5. Hirata, Y., Ishikawa, T., Choi, J., Sasaki, S.: Analysis of microstructure and surface morphology of a-C: H films deposited on a trench target. Diam. Relat. Mater. 83, 1–7 (2018)

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