Publisher
Springer International Publishing
Reference10 articles.
1. B.H. Wolf, K.N. Leung, B. Sharkow, R. Becker, T. Jolly, G. Alton, J. Ishikawa, Characteristics of ion sources, in Handbook of Ion Sources, ed. by B. Wolf (CRC Press, Boca Raton, 1995), pp. 23–329
2. H.R. Kaufman, J.M.E. Harper, J.J. Cuomo, Developments in broad beam, ion sources technology and applications. J. Vac. Sci. Technol. 21, 764–767 (1982)
3. A.H. Al-Bayati, D. Marton, S.S. Todorov, K.J. Boyd, J.W. Rabalais, D.G. Armour, J.S. Gordon, G. Duller, Performance of mass analyzed, low-energy, dual ion beam system for materials research. Rev. Sci. Instr. 65, 2680–2692 (1994)
4. J. W. Gerlach, P. Schumacher, M. Mensing, S. Rauschenbach, I. Cermak, B. Rauschenbach, Ion mass and energy selective hyperthermal ion-beam assisted deposition setup. Rev. Sci. Instrum. 88, 063306 (2017)
5. T. Takagi, lon-surface interactions during thin film deposition. J. Vac. Sci. Technol. A 2, 382–399 (1984)