Nanoscale Pattern Transfer by Etching

Author:

Cui Zheng

Publisher

Springer International Publishing

Reference83 articles.

1. Biebuyck, H.A., et al.: Lithography beyond light: microcontact printing with monolayer resists. IBM J Research & Development. 41(1/2), 159 (1997)

2. Xia, Y., Whitesides, G.M.: Soft lithography. Angew. Chem. Int. Ed. 37, 550–575 (1998)

3. Kendall, D.L., Shoultz, R.A.: Wet chemical etching of silicon and SiO2 and ten challenges for micromachiners. In: Rai-Coudhury, P. (ed.) Handbook of Microlithography, Micromachining and Microfabrication. SPIE Optical Engineering Press (1997)

4. Kendall, D.L., Shoultz, R.A.: Wet chemical etching of silicon and SiO2 and ten challenges for micromachiners. In: Rai-Coudhury, P. (ed.) Handbook of Microlithography, Micromachining and Microfabrication. SPIE Optical Engineering Press & IEE (1997)

5. IntelliSuite™ from IntelliSense Software Corp. https://www.intellisense.com/

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