Ultra-low pressure chemical vapour deposition of polycrystalline and amorphous silicon-Reference-Cited by-同舟云学术

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Ultra-low pressure chemical vapour deposition of polycrystalline and amorphous silicon

Published:1992 Issue:2 Volume:27 Page:479-484
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Ahmed W.,Meakin D. B.,Stoemenos J.,Economou N. A.,Pilkington R. D.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00543941.pdf

Reference16 articles.

1. L. W. Kennedy, D. E. H. Smith and D. V. McCaughan, J. Sci. Techn. 48 (1982) 90.

2. T. I. Kamins, M. M. Mandurah and K. C. Saraswat, J. Electrochem. Soc. 125 (1982) 90.

3. G. Harbeke, L. Krausbauer, E. F. Steigmeier and A. E. Widmer, RCA Rev. 44 (1983) 287.

4. R. S. Rosler, Solid State Techn. 20 (1977) 63.

5. S. Morozumi, K. Ogushi, T. Misawa, R. Araki and H. Otishima, in ?SID84 Digest 919840?, p. 316.

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Quality and reliability in diamond deposition using CVD;Surface Engineering;2000-10

2. Amorphous alloy ceramic composite membrane: preparation, characterization and reaction studies;Catalysis Letters;1997

3. Ion implantation and in situ doping of silicon;Materials Chemistry and Physics;1994-04

4. Mass spectral analysis of CVD processes;Surface and Coatings Technology;1993-04

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