Effects of laser fluence on the structural properties of pulsed laser deposited ruthenium thin films-Reference-Cited by-同舟云学术

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Effects of laser fluence on the structural properties of pulsed laser deposited ruthenium thin films

Published:2010-07-11 Issue:2 Volume:100 Page:561-568
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Lee Wai-Keat,Wong Hin-Yong,Chan Kah-Yoong,Yong Thian-Khok,Yap Seong-Shan,Tou Teck-Yong

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-010-5875-x.pdf

Reference39 articles.

1. M.N. Ashfold, F. Claeyssens, G.M. Fuge, S.J. Henley, Pulsed laser ablation and deposition of thin films. Chem. Soc. Rev. 33(1), 9 (2004)

2. D.B. Chrisey, G.K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley Interscience, New York, 1994)

3. T. Yoshitake, G. Shiraishi, K. Nagayama, Elimination of droplets using a vane velocity filter for pulsed laser ablation of FeSi2. Appl. Surf. Sci. 197–198, 379 (2002)

4. T.N. Arunagiri, Y. Zhang, O. Chyan, M. El-Bouanani, M.J. Kim, K.H. Chen, C.T. Wu, L.C. Chen, 5 nm ruthenium thin film as a directly plateable copper diffusion barrier. Appl. Phys. Lett. 86(8), 083104 (2005)

5. M.L. Green, M.E. Gross, L.E. Papa, K.J. Schnoes, D. Brasen, Chemical vapor deposition of ruthenium and ruthenium dioxide films. J. Electrochem. Soc. 132(11), 2677 (1985)

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