FTIR absorption spectroscopy as a novel method for thin film deposition rate measurement-Reference-Cited by-同舟云学术

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FTIR absorption spectroscopy as a novel method for thin film deposition rate measurement

Published:2013-08-30 Issue:4 Volume:114 Page:1295-1301
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Reichenbacher Thomas,Schuetz Simon,Stasewitsch Ilja,Fabig Stephan

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-013-7940-8.pdf

Reference21 articles.

1. J. Liebig, Justus Liebigs Ann. Chem. 98, 132 (1856)

2. J.E. Lilienfeld, Electrical current control mechanism. Canadian Patent 272,437A, 1927

3. W.B. Shockley, Semiconductor amplifier. US Patent 2,502,488A, 1950

4. W.B. Shockley, Circuit element utilizing semiconductive material. US Patent 2,569,347A, 1951

5. C. Buzea, K. Robbie, Rep. Prog. Phys. 68, 385 (2005)

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