Author:
Benazouz Ouafa,Kezzoula Faouzi,Schmidt Javier,Larbah Youssef,Kechouane Mohamed
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science,General Chemistry
Reference19 articles.
1. J. Jang, S.Y. Yoon, Metal induced crystallization of amorphous silicon. Int. J. High Speed Electron Syst. 10, 13–23 (2000)
2. C.-M. Hu, C. Yu-Cheng, C.S.W. Yew, ECS, Improving the electrical properties of NILC poly-Si films using gettering α-Si film through contact holes. Trans. ECS Trans. 16, 207–210 (2008)
3. J.-D. Hwang, J.-Y. Chang, G.J. Chen, Two-step annealing for nickel-induced crystallization of amorphous silicon films. J. Electrochem. Soc. 152, 487–490 (2005)
4. J.A. Schmidt, N. Budini, R.D. Arce et al., Polycrystalline silicon thin films on glass obtained by nickel-induced crystallization of amorphous silicon. Phys. Status Solidi 7, 600–603 (2010)
5. H. Li, M. Matsumoto, Effects of hydrogen concentration and cooling speed on fabrication of hydrogenated amorphous silicon: quantum simulation. Int. J. Theoret. Appl. Nanotechnol. 9, 1–7 (2021)
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