N+BF 2 and N+C+BF 2 high-dose co-implantation in silicon-Reference-Cited by-同舟云学术

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N+BF 2 and N+C+BF 2 high-dose co-implantation in silicon

Published:2003-03-01 Issue:5 Volume:76 Page:791-800
ISSN:0947-8396
Container-title:Applied Physics A: Materials Science & Processing
language:
Short-container-title:Applied Physics A: Materials Science & Processing

Author:

Barbadillo L.,Cervera M.,Hernández M.J.,Rodríguez P.,Piqueras J.,Molina S.I.,Ponce A.,Morales F.M.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-002-1503-8.pdf

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Aloe vera‐derived graphene‐coupled phenosafranin photocatalyst for generation and regeneration of ammonia and NADH by mimicking natural photosynthetic route;Photochemistry and Photobiology;2023-07-17

2. Graphene–BODIPY as a photocatalyst in the photocatalytic–biocatalytic coupled system for solar fuel production from CO2;Journal of Materials Chemistry A;2014

3. Crystalline Inclusions Formed in C+N+BF 2 Coimplanted on Silicon (111);Microchimica Acta;2004-04-01

4. SiBCN synthesis by high-dose N[sup +]+C[sup +]+BF[sub 2][sup +] ion implantation;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2004

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