1. S.Y. Chou, P.R. Krauss, P.J. Renstorm, Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett. 67, 3114 (1995)
2. T.C. Bailey, S.C. Johnson, S.V. Sreenivasan, J.G. Ekerdt, J.C. Willson, D.J. Resnick, Step and flash imprint lithography: an efficient nanoscale printing technology. J. Photopolym. Sci. Technol. 15, 481 (2002)
3. W.B. Jackson, M. Almanza-Workman, A. Chaiken, R. Garcia, A. Jeans, H.-J. Kim, O. Kwon, H. Luo, P. Mei, C. Perlov, C. Taussig, M.S. Shur, A. Koudymov, Large area flexible electronics fabricated using self-aligned imprint lithography. ECS Trans. 8(1), 197 (2007)
4. A. Miyauchi, Sheet nanoimprint for film fabrication, in 1st Asian Symposium on Nano Imprint Lithography (ASNIL 2008), 1, 2008
5. M. Ogino, M. Hasegawa, K. Sakaue, S. Nagai, A. Miyauchi, Jpn. J. Appl. Phys. 52, 035201 (2013)