Structuring of photosensitive material below diffraction limit using far field irradiation-Reference-Cited by-同舟云学术

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Structuring of photosensitive material below diffraction limit using far field irradiation

Published:2013-08-28 Issue:2 Volume:113 Page:263-272
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Yadavalli Nataraja Sekhar,Saphiannikova Marina,Lomadze Nino,Goldenberg Leonid M.,Santer Svetlana

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-013-7945-3.pdf

Reference49 articles.

1. Y. Zhao, T. Ikeda, Smart Light-Responsive Materials: Azobenzene-Containing Polymers and Liquid Crystals (Wiley, Hoboken, 2009)

2. C. Barrett, P. Rochon, A. Natansohn, J. Phys. Chem. 100, 8836 (1996)

3. V. Toschevikov, M. Saphiannikov, G. Heirich, J. Phys. Chem. B 113, 5032 (2009)

4. V. Toschevikov, M. Saphiannikov, G. Heirich, J. Phys. Chem. B 116, 913 (2012)

5. M. Saphiannikova, T.M. Geue, O. Henneberg, K. Morawetz, U. Pietsch, J. Chem. Phys. 120, 4039 (2004)

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