High-rate reactive magnetron sputtering of zirconia films for laser optics applications-Reference-Cited by-同舟云学术

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High-rate reactive magnetron sputtering of zirconia films for laser optics applications

Published:2014-01-17 Issue:3 Volume:116 Page:1229-1240
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Juškevičius K.,Audronis M.,Subačius A.,Drazdys R.,Juškėnas R.,Matthews A.,Leyland A.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-013-8214-1.pdf

Reference52 articles.

1. G. Abromavicius, R. Buzelis, R. Drazdys, K. Juskevicius, S. Kicas, T. Tolenis, J. Mirauskas, M. Sciuka, V. Sirutkaitis, A. Melninkaitis, Lith. J. Phys. 51, 303 (2011)

2. A. Melninkaitis, D. Mikšys, V. Sirutkaitis, G. Abromavičius, R. Buzelis, R. Drazdys, Proc. SPIE 6596, 65961I (2006)

3. G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, V. Sirutkaitis, Proc. SPIE 6720, 67200Y (2007)

4. X. Fu, A. Melnikaitis, L. Gallais, S. Kicas, R. Drazdys, V. Sirutkaitis, M. Commandré, Opt. Express 20(23), 26089 (2012)

5. B. Mangote, L. Gallais, M. Zerrad, M. Commandré, L.H. Gao, F. Lemarchand, M. Lequime, A. Melninkaitis, J. Mirauskas, V. Sirutkaitis, S. Kicas, T. Tolenis, R. Drazdys, M. Mende, L. Jensen, H. Ehlers, D. Ristau, Proc. SPIE 8168, 816815 (2011)

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