Performance of Erbium-doped TiO2 thin film grown by physical vapor deposition technique-Reference-Cited by-同舟云学术

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Performance of Erbium-doped TiO2 thin film grown by physical vapor deposition technique

Published:2017-08-08 Issue:9 Volume:123 Page:
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Lahiri Rini,Ghosh Anupam,Dwivedi Shyam Murli Manohar Dhar,Chakrabartty Shubhro,Chinnamuthu P.,Mondal Aniruddha

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/article/10.1007/s00339-017-1180-2/fulltext.html

Reference47 articles.

1. P. Cheong, K. Chang, Y. Lai, S. Ho, I. Sou, K. Tam, IEEE Trans. Ind. Electron. 58(11), 5271–5277 (2011)

2. S.I. Inamdar, K.Y. Rajpure, J. Alloys Compd. 595, 55–59 (2014)

3. J.T. Clarke, W.R. Skinner, M.B. Vincent, T. Irgang, V. Suratkal, H. Grassl, J.T. Trauger, Appl. Opt. 38, 1803–1813 (1999)

4. L. Shi, S. Nihtianov, IEEE Sens. J. 12, 2453–2459 (2012)

5. G. Bertuccio, D. Puglisi, L. Torrisi, C. Lanzieri, Appl. Surf. Sci. 272, 128–131 (2013)

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