A pulsed laser ablation/plasma chemical vapor deposition tandem system for combinatorial device fabrication-Reference-Cited by-同舟云学术

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A pulsed laser ablation/plasma chemical vapor deposition tandem system for combinatorial device fabrication

Published:2004-09 Issue:4-6 Volume:79 Page:1413-1416
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Matsuki N.,Abiko Y.,Kobayashi M.,Miyazaki K.,Fujioka H.,Koinuma H.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-004-2796-6.pdf

Reference20 articles.

1. H. Koinuma, H. Fujioka, C. Hu, T. Koida, M. Kawasaki: Proc. Mater. Res. Soc. Symp. 426, 95 (1996)

2. H. Fujioka, M. Oshima, C. Hu, N. Matsuki, K. Miyazaki, H. Koinuma: J. Non-Cryst. Solids 227–230, 1287 (1998)

3. K. Miyazaki, N. Matsuki, H. Shinno, H. Fujioka, M. Oshima, H. Koinuma: Bull. Mater. Sci. 22, 729 (1999)

4. K. Miyazaki, H. Fujioka, M. Oshima, H. Koinuma: Bull. Mater. Sci. 22, 869 (1999)

5. Y. Matsumoto, M. Murakami, Z.W. Jin, A. Ohtomo, M. Lipmaa, M. Kawasaki, H. Koinuma: Jpn. J. Appl. Phys. 38, L603 (1999)

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1. Combinatorial preparation and characterization of thin-film multilayer electro-optical devices;Review of Scientific Instruments;2007-07

2. Field-effect a-Si:H solar cells with transparent conductive oxide comb-shaped electrodes;Thin Solid Films;2005-08

3. Anin-situFabrication and Characterization System Developed for High Performance Organic Semiconductor Devices;Japanese Journal of Applied Physics;2005-06-10

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