Growth study of indium-catalyzed silicon nanowires by plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Growth study of indium-catalyzed silicon nanowires by plasma enhanced chemical vapor deposition

Published:2010-06-11 Issue:1 Volume:100 Page:287-296
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Zardo I.,Conesa-Boj S.,Estradé S.,Yu L.,Peiro F.,Roca i Cabarrocas P.,Morante J. R.,Arbiol J.,Fontcuberta i Morral A.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-010-5802-1.pdf

Reference60 articles.

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2. M.T. Bjork, B.J. Ohlsson, T. Sass, A.I. Persson, C. Thelander, M.H. Magnusson, K. Deppert, L.R. Wallenberg, L. Samuelson, Appl. Phys. Lett. 80, 1058 (2002)

3. S. Neusser, D. Grundler, Adv. Mater. 21, 2917 (2009)

4. S. De Franceschi, J.A. van Dam, E.P.A.M. Bakkers, L.F. Feiner, L. Gurevich, L.P. Kouwenhoven, Appl. Phys. Lett. 83, 344 (2003)

5. E.D. Minot, F. Kelkensberg, M. van Kouwen, J.A. van Dam, L.P. Kouwenhoven, V. Zwiller, M.T. Borgstrom, O. Wunnicke, M.A. Verheijen, E.P.A.M. Bakkers, Nano Lett. 7, 367 (2007)

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