Abstract
AbstractThe dynamic interactions of ions with matter drive a host of complex evolution mechanisms, requiring monitoring on short spatial and temporal scales to gain a full picture of a material response. Understanding the evolution of materials under ion irradiation and displacement damage is vital for many fields, including semiconductor processing, nuclear reactors, and space systems. Despite materials in service having a dynamic response to radiation damage, typical characterization is performed post-irradiation, washing out all information from transient processes. Characterizing active processes in situ during irradiation allows the mechanisms at play during the dynamic ion-material interaction process to be deciphered. In this review, we examine the in situ characterization techniques utilized for examining material structure, composition, and property evolution under ion irradiation. Covering analyses of microstructure, surface composition, and material properties, this work offers a perspective on the recent advances in methods for in situ monitoring of materials under ion irradiation, including a future outlook examining the role of complementary and combined characterization techniques in understanding dynamic materials evolution.
Funder
Idaho National Laboratory
Office of Defense Nuclear Nonproliferation
Publisher
Springer Science and Business Media LLC
Subject
General Engineering,General Materials Science
Reference146 articles.
1. J.P. Allain and A. Shetty, J. Phys. D: Appl. Phys. 50, 283002. (2017).
2. P. Sigmund and N.Q. Lam, Kongelige Danske Videnskabernes Selskab Det, Matematisk-Fysiske Meddelelser 43, 255. (1993).
3. S.M.S. Privitera and E. Rimini, Mater. Sci. Semicond. Process. 135, 106087. (2021).
4. J. Zheng, R. Yang, L. Xie, J. Qu, Y. Liu, and X. Li, Adv. Mater. 22, 1451. (2010).
5. P.D. Townsend, J.C. Kelly, and N.E.W. Hartley, Ion implantation, sputtering and their applications, (Academic Press, 1976).
Cited by
4 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献