Combining informetrics and trend analysis to understand past and current directions in electronic design automation

Author:

Curiac Christian-DanielORCID,Doboli Alex

Abstract

AbstractThere has been increasing interest in the study of research communities with the goal of optimizing their outcomes and impact. While current methods can predict future trends, they offer little insight about the causes of the trends. However, causal insight is important for strategic decision making to improve a community. This paper presents a new method to predict the possible causes for inefficiencies in a community by relating them to disconnections between trends, like trends in the number of publications, patents, citations, and so on. The method combines traditional scientometric and webometric metrics and metric predictions with a recent model for trend analysis in a community. The proposed method was used to analyze electronic design automation (EDA) domain. The analysis showed intriguing disconnections between the trends of the number of papers, number of granted patents, and impact of its main publications. The analysis suggests a slightly decreasing impact and visibility of EDA, while having less novel, commonly-accepted knowledge in the area. The gained insight suggests three possible strategic decisions to improve EDA community: avoiding to ignore new ideas, reducing the complexity of framed problems, and keeping a minimal gap between real-life needs and academic solutions.

Funder

Technische Universität München

Publisher

Springer Science and Business Media LLC

Subject

Library and Information Sciences,Computer Science Applications,General Social Sciences

Reference79 articles.

1. Agnesina, A., Chang, K., & Lim, S. (2020). Vlsi placement parameter optimization using deep reinforcement learning. In Proceedings of the international conference on computer-aided design.

2. Akaike, H. (1974). A new look at the statistical model identification. IEEE Transactions on Automatic Control, 19(6), 716–723.

3. Akers, L. (2003). The future of patent information. A user with a view World Patent Information. Elsevier, 25(4), 303–312.

4. Bahar, R., Jones, A.K., Katkoori, S., Madden, P.H., Marculescu, D., Markov, I.L.(2014). Workshops on Extreme Scale Design Automation (ESDA) challenges and opportunities for 2025 and beyond. arXiv preprint arXiv:2005.01588

5. Bergstrom, C. T., West, J. D., & Wiseman, M. A. (2008). The eigenfactor metrics. Journal of Neuroscience, 28(45), 11433–11434.

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3