1. For an introduction see e.g. Lin, B.J.: Optical methods for fine line lithography. In: Materials processing- theory and practices. Newman, R. (ed.), Vol. 1. Amsterdam, New York: North Holland Publishing 1980
2. Spiller E., Feder R.: X-ray lithography. In: X-ray optics. Topics in Applied Physics. Vol. 22. Queisser, H.-J. (ed.). Berlin, Heidelberg, New York: Springer Verlag 1977
3. Neureuther, A.R.: Microlithography with X-rays. In: Synchrotron radiation research. Doniach, S., Winick, H. (eds.). New York: Plenum Press 1980
4. Grobman, W.D.: Synchrotron radiation X-ray lithography. In: Handbook on synchrotron radiation. Koch, E.E. (ed.), Vol. 1B. Amsterdam, New York: North Holland Publishing 1983
5. Weber, E.V.: Application of electron beam technology to large scale, integrated circuits. In materials processing-theory and practices. Newman, R. (ed.), Vol. 1. Amsterdam, New York: North Holland Publishing 1980