The metallurgical control of electromigration failure in narrow conducting lines-Reference-Cited by-同舟云学术

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The metallurgical control of electromigration failure in narrow conducting lines

Published:1996-05 Issue:5 Volume:48 Page:43-46
ISSN:1047-4838
Container-title:JOM
language:en
Short-container-title:JOM

Author:

Morris J. W.,Kim C. -U.,Kang S. H.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF03222942.pdf

Reference8 articles.

1. C. Kim and J.W. Morris, Jr., J. Appl. Phys., 72 (1992), p. 1837.

2. C. Kim and J.W. Morris, Jr., J. Appl. Phys., 73 (1993), p. 4885.

3. S.H. Kang et al., J. Appl. Phys. (in press).

4. R. Rosenberg, A.F. Mayadas, and D. Gupta, Surface Science, 31 (1972), p. 566.

5. T. Nemoto and T. Nogami, Proceedings of the 32nd International Reliability Physics Symposium (New York: IEEE, 1994), p. 207.

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