Simulation and experimental studies of FTO/WO3 and FTO/WO3/Ag thin film structures for electrochromic analysis deposited by DC & RF magnetron sputtering-Reference-Cited by-同舟云学术

Simulation and experimental studies of FTO/WO3 and FTO/WO3/Ag thin film structures for electrochromic analysis deposited by DC & RF magnetron sputtering

Published:2024-08 Issue:24 Volume:35 Page:
ISSN:0957-4522
Container-title:Journal of Materials Science: Materials in Electronics
language:en
Short-container-title:J Mater Sci: Mater Electron

Author:

Kumar Kilari Naveen^ORCID,Nithya G,Reddy G Srinivas,Radhalayam Dhanalakshmi,Prakash Nunna Guru,Altaf Mohammad,Ko Tae Jo

Publisher

Springer Science and Business Media LLC

Link

https://link.springer.com/content/pdf/10.1007/s10854-024-13396-5.pdf

Reference23 articles.

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3. Y. Yamada, K. Tabata, T. Yashima, The character of WO3 film prepared with RF sputtering. Sol. Energy Mater. Sol. Cells 91, 29–37 (2007). https://doi.org/10.1016/j.solmat.2005.11.014

4. K.N. Kumar, S.A. Sattar, H. Shaik, G.V. Ashok Reddy, R.I. Jafri, M. Dhananjaya, A.S. Pawar, N.G. Prakash, R. Premkumar, S. Ansar, L.N. Chandrashekar, P. Aishwarya, Effect of partial pressure of oxygen, target current, and annealing on DC sputtered tungsten oxide (WO3) thin films for electrochromic applications. Solid State Ion. (2023). https://doi.org/10.1016/j.ssi.2023.116275

5. G.V. Ashok Reddy, K.N. Kumar, H.D. Shetty, C. Devaraja, M. Dhananjaya, S.M. Hunagund, Materials today: proceedings comparison study of WO 3 thin film and nanorods for smart window applications. Mater. Today Proc. (2023). https://doi.org/10.1016/j.matpr.2023.03.052