Effects of processing parameters on crystalline structure and optoelectronic behavior of DC sputtered ITO thin film-Reference-Cited by-同舟云学术

Effects of processing parameters on crystalline structure and optoelectronic behavior of DC sputtered ITO thin film

Published:2016-09-09 Issue:1 Volume:28 Page:787-797
ISSN:0957-4522
Container-title:Journal of Materials Science: Materials in Electronics
language:en
Short-container-title:J Mater Sci: Mater Electron

Author:

Shakiba M.,Kosarian A.,Farshidi E.

Funder

khuzestan Regional Electric Company, Ahvaz, Iran.

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s10854-016-5591-1.pdf

Reference49 articles.

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2. J.B. Chu, S.M. Huang, H.B. Zhu, X.B. Xu, Z. Sun, Y.W. Chen, F.Q. Huang, Preparation of indium tin oxide thin films without external heating for application in solar cells. J. Non Cryst. Solids 354, 54805484 (2008)

3. H.L. Hartnagel, A.L. Dawar, A.K. Jain, C. Jagadish, Semiconducting Transparent Thin Films (Institute of Physics, Bristol, 1995)

4. W.F. Wu, B.S. Chiou, S.T. Hsieh, Effect of sputtering power on the structural and optical properties of RF magnetron sputtered ITO films’. Semicond. Sci. Technol. 9, 12421249 (1994)

5. S.M. Rozati, T. Ganj, Transparent conductive Sn-doped indium oxide thin films deposited by spray pyrolysis technique. Renew. Energy 29, 1671–1676 (2004)

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