On the oxygen content in sputtering InOx film for transparent electronics-Reference-Cited by-同舟云学术

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On the oxygen content in sputtering InOx film for transparent electronics

Published:2014-02-27 Issue:4 Volume:25 Page:1804-1809
ISSN:0957-4522
Container-title:Journal of Materials Science: Materials in Electronics
language:en
Short-container-title:J Mater Sci: Mater Electron

Author:

Chuang Miao-Ju,Chu Ann-Kuo,Wang Jee-Ray

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s10854-014-1802-9.pdf

Reference22 articles.

1. J. Jang, K. Cho, S.H. Lee, S. Kim, Nanotechnology 19, 015204 (2008)

2. M.C. Choi, Y. Kim, C.S. Ha, Prog. Polym. Sci. 33, 581 (2008)

3. P.F. Baude, D.A. Ender, M.A. Haase, T.W. Kelley, D.V. Muyres, S.D. Theiss, Appl. Phys. Lett. 82, 3964 (2003)

4. S.L.P. Tang, Trans. Inst. Meas. Control 29, 283 (2007)

5. M.G. Kim, M.G. Kanatzidis, A. Facchetti, T.J. Marks, Nat. Mater. 10, 382 (2011)

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