1. Kern, W.A., Poutinen, D.A.: The measurement of effective complex refractive indices for selected metal silicides. RCA Rev. 31, 187 (1970)
2. dos Santos Filho, S.G., Hasenack, C.M., Salay, L.C., Mertens, P.: A less critical cleaning procedure for silicon wafer using diluted HF dip and boiling in isopropyl alcohol as final steps. J. Electrochem. Soc. 142(3), 902–907 (1995)
3. Gandhi, S.K.: The Theory and Practice of Microelectronics. Wiley, New York (1968)
4. Crank, J.: The Mathematics of Diffusion. Oxford University Press, Walton Street, Oxford (1956)
5. Grove, A.S.: Physics and Technology of Semiconductor Devices. Wiley, New York (1967)